Magnetron sputtering of CoCr/Cr and CoCrTa/Cr on flexible substrates

被引：3

作者：

Veldeman, J ^{[1
]}

Jia, H ^{[1
]}

Burgelman, M ^{[1
]}

机构：

[1] Univ Ghent, ELIS, B-9000 Ghent, Belgium

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2000年 / 36卷 / 05期

关键词：

magnetic properties; plastic substrates; sputtering; thin films;

D O I：

10.1109/20.908426

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates, By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples were characterized by magnetic measurements [hysteresis curve (H-c, M-r, M-s), remanence and deltaM measurements], and by XRD and AFM.

引用

收藏

页码：2351 / 2353

页数：3

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