Magnetic interactions in CoCr films sputtered with different magnetron configurations

被引：3

作者：

Veldeman, J ^{[1
]}

Jia, H ^{[1
]}

Burgelman, M ^{[1
]}

机构：

[1] State Univ Ghent, Dept Elect & Informat Syst ELIS, B-9000 Ghent, Belgium

来源：

PHYSICA B | 2000年 / 275卷 / 1-3期

关键词：

magnetron configuration; remanence curves; voided structure; AFM;

D O I：

10.1016/S0921-4526(99)00775-9

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The aim of this work is to investigate the influence of the magnetron configuration on the magnetic interactions in DC magnetron sputtered Cr/Co88Cr12 films on a PET substrate. The sputter pressure is used as an extra parameter. Four different magnetron configurations were investigated, two of type I and two of type II. With a type I magnetron the optimum sputter pressure is lower than with a type II magnetron. In type I configurations (low ion bombardment) the optimum sputter pressure is determined by an optimum voided structure, In type II magnetrons a high ion bombardment shifts the optimum voided structure to higher sputter pressures due to the compensation of the shadowing effect during sputtering. The optimum voided structure is characterised by remanence and AFM measurements. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：258 / 261

页数：4

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