Correlations between electrical and optical properties for OMVPE InN

被引:37
作者
Yamamoto, A
Sugita, K
Takatsuka, H
Hashimoto, A
Davydov, VY
机构
[1] Univ Fukui, Dept Elect & Elect Engn, Fukui 9108507, Japan
[2] RAS, AF Ioffe Physicotech Inst, St Petersburg 19402, Russia
关键词
metalorganic vapor phase epitaxy; nitrides; semiconducting III-V materials;
D O I
10.1016/j.jcrysgro.2003.11.082
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
An experimental study has been made of correlations between electrical and optical properties for OMVPE InN grown on sapphire substrate. Carrier concentration for a grown film is found to decrease with increasing growth temperature and shows the lowest value 5.8 x 10(18) cm(-3) at 600degreesC. A strong photoluminescence (PL) with a peak energy of 0.7-0.8 eV is observed at room temperature. As a general trend, PL peak energy and optical absorption edge increase with increasing carrier concentration (Burstein-Moss shift). For relatively thick films with large grains, grown at a relatively high temperature, a discrepancy is found between carrier concentration obtained by Hall measurement and PL data. Such samples show a PL spectrum with a lower peak energy and a smaller FWHM in spite of a higher carrier concentration. Although Hall measurement gives a carrier concentration as high as 2.3 x 10(19) cm(-3) for the sample grown at 620degreesC, this sample should have a much lower carrier concentration because the PL peak energy is lower than that for the sample with the lowest carrier concentration 5.8 x 10(18) cm(-3). These results show that the optimum growth temperature is higher than 600degreesC determined from the electrical characterisation. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:275 / 279
页数:5
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