Effects of He gas addition on the production of active particles in rf magnetron sputtering

被引：10

作者：

Harada, K

Kishida, S

Matsuoka, T

Maruyama, T

Tokutaka, H

Fujimura, K

Koyanagi, T

Fujii, T

机构：

[1] YAMAGUCHI UNIV,FAC ENGN,UBE,YAMAGUCHI 755,JAPAN

[2] KANSAI RES INST,SHIMOGYO KU,KYOTO 600,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 6A期

关键词：

high T-c; BSCCO; thin film; He gas; rf magnetron sputtering; Penning process; optical emission spectroscopy; X-ray photoelectron spectroscopy;

D O I：

10.1143/JJAP.35.3590

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We measured optical emission spectra during the deposition of Bi2Sr2Can-1CunOx (BSCCO) films by an rf magnetron sputtering method with a BSCCO powder target. It was shown that the active particles produced are ionized oxygen molecules and CuO radicals when He + O-2 is used as a sputtering gas. The results of X-ray photoelectron spectroscopy indicated that the BSCCO films prepared using He gas have the same metal composition as the target. In addition, we confirmed that the use of He as a sputtering gas enhances the oxidation in the preparation of CuO films.

引用

页码：3590 / 3594

页数：5

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