GaAs(111)B(√19X√19)R23.4° surface reconstruction

被引:15
作者
Farrell, HH
Lu, J
Schultz, BD
Denison, AB
Palmstrom, CJ
机构
[1] Bechtel BWXT Idaho LLC, Idaho Natl Engn & Environm Lab, Idaho Falls, ID 83415 USA
[2] Univ Minnesota, Dept Chem Engn & Mat Sci, Minneapolis, MN 55455 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2001年 / 19卷 / 04期
关键词
D O I
10.1116/1.1387460
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The structure of the GaAs(1 1 1)B(root 19 X root 19)R23.4 degrees surface reconstruction has been determined using x-ray photoelectron spectroscopy and scanning tunneling microscopy. This structure is characterized by the sixfold As crown first found by Biegelsen and co-workers. In addition, we find that both As and Ga atoms occur in antisite positions in the top bilayer, and possibly in underlying layers as well. These antisite atoms are proposed to enhance the island formation involved in the epitaxial growth self-assembling nanostructures, and to interfere with the layer-by-layer growth that characterizes homo-and heteroepitaxy on most GaAs surfaces. Unlike several earlier structures proposed for this reconstruction, we propose that all of the As (Ga) dangling orbitals are filled (empty), consistent with the electron counting rule. (C) 2001 American Vacuum Society.
引用
收藏
页码:1597 / 1605
页数:9
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