Experimental study of perpendicular transport in weakly coupled AlxGa1-xN/GaN superlattices

被引:24
作者
Waldron, EL
Li, YL
Schubert, EF
Graff, JW
Sheu, JK
机构
[1] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[2] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02155 USA
[3] Natl Cent Univ, Ctr Opt Sci, Chungli 32054, Taiwan
关键词
D O I
10.1063/1.1631382
中图分类号
O59 [应用物理学];
学科分类号
摘要
Perpendicular transport characteristics of n-type AlxGa1-xN/GaN superlattices are presented. Planar and mesa-etched superlattice structures are employed to identify the perpendicular resistance. Perpendicular transport measurements in Al0.22Ga0.78N/GaN superlattices display linear current-voltage characteristics with a resistivity that is a factor of 6.6 higher than for bulk material. A theoretical model is developed for perpendicular transport in AlxGa1-xN/GaN superlattices based on sequential tunneling. The model shows that short superlattice periods are required to minimize the perpendicular resistivity. (C) 2003 American Institute of Physics.
引用
收藏
页码:4975 / 4977
页数:3
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