Electron beam recording beyond 200 Gbit/in2 density for next generation optical disk mastering

被引：11

作者：

Katsumura, M ^{[1
]}

Sato, M ^{[1
]}

Hashimoto, K ^{[1
]}

Hosoda, Y ^{[1
]}

Kasono, O ^{[1
]}

Kitahara, H ^{[1
]}

Kobayashi, M ^{[1
]}

Iida, T ^{[1
]}

Kuriyama, K ^{[1
]}

机构：

[1] Pioneer Corp, Lab 1, Nanoproc Technol Dept, Corp Res & Dev, Tsurugashima, Saitama 3502288, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 5B期

关键词：

optical disk; mastering; electron beam; scattering; jitter;

D O I：

10.1143/JJAP.44.3578

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We had developed an electron beam recorder for high-density mastering. The electron beam recorder has a capability to record high-density patterning beyond 200 Gbit/in(2) density because it has characteristic of fine beam convergence. The behavior of electron scattering is important to realizing high-density patterning. Scattered electrons degrade patterning resolution and high-density patterning can not be realized. Thus, we adopted a new substrate made of a material that reduces the influence of the electron backscattering and attempted to record high density patterning beyond 200 Gbit/in(2) density. As experimental result, 300 Gbit/in(2) density patterning could be realized.

引用

页码：3578 / 3582

页数：5

共 4 条

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