Improvement of electron beam mastering using dry etching process

被引:9
作者
Kasono, O
Sato, M
Sugimoto, T
Kojima, Y
Katsumura, M
机构
[1] PIONEER Corp, Corp Res & Dev Labs, Tsurugashima, Saitama 3502288, Japan
[2] PIONEER Corp, PDP Dev Ctr, Yamanashi 4093889, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2004年 / 43卷 / 7B期
关键词
optical disk; mastering; electron beam; dry etching; plasma etching; scattering; roughness; ROM disk; jitter;
D O I
10.1143/JJAP.43.5078
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have developed an electron beam recorder and utilized it in high-density disk mastering. We discussed an electron scattering in disk mastering that degrades the reproduction performance of disks. In order to improve the reproduction performance, we applied a dry etching process to the disk mastering process, and confirmed its efficacy in reducing the scattering effect and improving disk noise by calculation and experiments. We fabricated 'Blu-ray Disc'-type read-only memory disks with and without the dry etching process, and noticed the advantage of the dry etching process from the jitter comparison. Finally, a 4.7% jitter was achieved in a 25 GB capacity disk, while a 5.7% jitter was obtained in a 27 GB capacity disk with additional recording compensation.
引用
收藏
页码:5078 / 5084
页数:7
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