Energetic oxygen ions in the reactive sputtering of the Zr target in Ar+O2 atmosphere

被引:20
作者
Tominaga, K [1 ]
Kikuma, T [1 ]
机构
[1] Univ Tokushima, Dept Elect & Elect Engn, Tokushima 7708506, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2001年 / 19卷 / 04期
关键词
D O I
10.1116/1.1368664
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In the sputtering of the Zr oxide target of Ar/O-2 atmosphere, strong energetic oxygen ions are generated in the sputtering. This is related to the strong oxidation at the Zr surface. The flux of the energetic oxygen ions was estimated in the reactive sputtering of Zr using a probe, constructed here. The dependence of the energetic oxygen ions on the ratio R-O2, representing the ratio of the oxygen gas flow to a total gas flow was observed. At the same time, we observed the photoemission intensity from the sputtered Zr atoms in order to monitor the target surface oxidation. The results show that the Zr target is very active in the oxygen atmosphere, and oxidized drastically at the critical point of Ro, where the generation of oxidized islands overcomes the sputtering rate. The flux of the energetic oxygen ions for the Zr target is two or three times stronger than that for the Zn target at the first stage, and ten times at the higher oxygen pressure ratio R-O2. The generation of thick oxidized lavers on the Zr target gives a strong negative oxygen ions flux. (C) 2001 American Vacuum Society.
引用
收藏
页码:1582 / 1585
页数:4
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