共 9 条
[1]
SIGNIFICANCE OF NEGATIVE-ION FORMATION IN SPUTTERING AND SIMS ANALYSIS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (02)
:281-287
[2]
HATA T, 1998, P 4 INT S SPUTT PLAS, P135
[3]
EFFECTS OF NITROGEN PRESSURE AND ION FLUX ON THE PROPERTIES OF DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZR-N FILMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1995, 13 (06)
:2808-2813
[6]
ENERGY ANALYSIS OF HIGH-ENERGY NEUTRAL ATOMS IN THE SPUTTERING OF ZNO AND BATIO3
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1982, 21 (05)
:688-695
[8]
VOSSEN JL, 1978, THIN FILM PROCESSES, P11
[9]
WESTWOOD WD, 1989, PHYS THIN FILMS, V14, P1