Interface engineering of high-Mg-content MgZnO/BeO/Si for p-n heterojunction solar-blind ultraviolet photodetectors

被引:40
作者
Liang, H. L. [1 ]
Mei, Z. X. [1 ]
Zhang, Q. H. [1 ]
Gu, L. [1 ]
Liang, S. [1 ]
Hou, Y. N. [1 ]
Ye, D. Q. [1 ]
Gu, C. Z. [1 ]
Yu, R. C. [1 ]
Du, X. L. [1 ]
机构
[1] Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100190, Peoples R China
基金
美国国家科学基金会;
关键词
MOLECULAR-BEAM EPITAXY; SI SUBSTRATE; GROWTH; FILMS; DETECTORS; ZNO;
D O I
10.1063/1.3595342
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-quality wurtzite MgZnO film was deposited on Si(111) substrate via a delicate interface engineering using BeO, by which solar-blind ultraviolet photodetectors were fabricated on the n-MgZnO(0001)/p-Si(111) heterojunction. A thin Be layer was deposited on clean Si surface with subsequent in situ oxidation processes, which provides an excellent template for high-Mg-content MgZnO growth. The interface controlling significantly improves the device performance, as the photodetector demonstrates a sharp cutoff wavelength at 280 nm, consistent with the optical band gap of the epilayer. Our experimental results promise potential applications of this technique in integration of solar-blind ultraviolet optoelectronic device with Si microelectronic technologies. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3595342]
引用
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页数:3
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