Low threshold MBE-grown AllnGaAs/AlGaAs strained multiquantum-well lasers by rapid thermal annealing

被引:8
作者
Ko, J
Chen, CH
Coldren, LA
机构
[1] Elec. and Comp. Eng. Department, University of California, Santa Barbara
关键词
rapid thermal processing; molecular beam epitaxial growth; semiconductor quantum wells;
D O I
10.1049/el:19961378
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
With post-growth rapid thermal annealing (RTA), 824 nm strained Al0.15In0.25Ga0.6As multiquantum-well (MQW) lasers grown by solid source molecular beam epitaxy (MBE) showed a record low threshold current density of 83 A/cm(2) per well. Ridge waveguide lasers fabricated from the same material exhibited pulsed threshold current of 5 mA and 62% external quantum efficiency without facet coating. In addition, 1.4 K photoluminescence (PL) study suggests that RTA is very effective in removing nonradiative centres in the active region.
引用
收藏
页码:2099 / 2100
页数:2
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