Monitoring of the ion energy and current density at the surface of films grown by excimer laser ablation

被引:11
作者
Franghiadakis, Y
Fotakis, C
Tzanetakis, P
机构
[1] Inst Educ Technol, Sch Technol Applicat, Heraklion 71500, Crete, Greece
[2] FORTH, Inst Elect Struct & Laser, Heraklion 71110, Crete, Greece
[3] Univ Crete, Dept Phys, Heraklion 71003, Crete, Greece
关键词
D O I
10.1063/1.368097
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simple and easy to implement, ion time-of-fight (TOF), detection system has been developed and used to monitor the ions ejected during pulsed excimer laser ablation of solid and molten Si and Ge targets. The setup employs a Faraday cup (FC) detector with a high gain-bandwidth preamplifier and an adjustable voltage electrostatic barrier. The FC is capable of very long time, undisturbed, operation even with significant deposition of material on it. The analysis of the TOF ion signal and its modification by the barrier potential yields valuable quantitative information about the ion flux and kinetic energy at the surface of the growing film. The technique is capable of resolving atomic/cluster components of different charge to mass ratios. High ion fractions and ion energies are observed, in all cases studied, when the laser fluence is clearly above the ablation threshold. (C) 1998 American Institute of Physics, [S0021-8979(98)05914-3].
引用
收藏
页码:1090 / 1094
页数:5
相关论文
共 17 条
[1]   Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: Application to silicon and germanium [J].
Antoni, F ;
Fuchs, C ;
Fogarassy, E .
APPLIED SURFACE SCIENCE, 1996, 96-8 :50-54
[2]   INVESTIGATION OF LASER-PRODUCED PLASMAS FROM METAL-SURFACES [J].
DEMTRODER, W ;
JANTZ, W .
PLASMA PHYSICS, 1970, 12 (09) :691-+
[3]   LOW-TEMPERATURE SYNTHESIS OF SILICON-OXIDE, OXYNITRIDE, AND NITRIDE FILMS BY PULSED EXCIMER-LASER ABLATION [J].
FOGARASSY, E ;
FUCHS, C ;
SLAOUI, A ;
DEUNAMUNO, S ;
STOQUERT, JP ;
MARINE, W ;
LANG, B .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (05) :2612-2620
[4]  
FOLTYN SR, 1994, PULSED LASER DEPOSIT, P117
[5]   HYDROGEN DISSOCIATION AND INCORPORATION INTO AMORPHOUS-SILICON PRODUCED BY ELECTRON-BEAM EVAPORATION [J].
FRANGHIADAKIS, Y ;
TZANETAKIS, P .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (02) :136-143
[6]  
HUBLER GK, 1994, PULSED LASER DEPOSIT, pCH13
[7]   LASER-INDUCED PLASMAS FOR PRIMARY ION DEPOSITION OF EPITAXIAL GE AND SI FILMS [J].
LUBBEN, D ;
BARNETT, SA ;
SUZUKI, K ;
GORBATKIN, S ;
GREENE, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (04) :968-974
[8]   ION EMISSION STUDIES OF PULSED-LASER EVAPORATION OF YBA2CU3O7 [J].
LUNNEY, JG ;
LAWLER, JF ;
ARATARI, R .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) :4277-4279
[9]  
Metev S., 1994, PULSED LASER DEPOSIT
[10]   DIAGNOSIS OF LASER-PRODUCED PLASMA WITH CHARGE COLLECTORS [J].
PELAH, I .
PHYSICS LETTERS A, 1976, 59 (05) :348-350