Defect clustering during ion irradiation of GaAs: Insight from molecular dynamics simulations

被引:56
作者
Nordlund, K
Peltola, J
Nord, J
Keinonen, J
Averback, RS
机构
[1] Univ Helsinki, Accelerator Lab, FIN-00014 Helsinki, Finland
[2] Univ Illinois, Mat Res Lab, Urbana, IL 61801 USA
关键词
D O I
10.1063/1.1384856
中图分类号
O59 [应用物理学];
学科分类号
摘要
Defect formation in compound semiconductors such as GaAs under ion irradiation is not as well understood as in Si and Ge. We show how a combination of ion range calculations and molecular dynamics computer simulations can be used to predict the atomic-level damage structures produced by MeV ions. The results show that the majority of damage produced in GaAs both by low-energy self-recoils and 6 MeV He ions is in clusters, and that a clear majority of the isolated defects are interstitials. Implications of the results for suggested applications are also discussed. (C) 2001 American Institute of Physics.
引用
收藏
页码:1710 / 1717
页数:8
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