Density multiplication and improved lithography by directed block copolymer assembly

被引：1099

作者：

Ruiz, Ricardo ^{[1
]}

Kang, Huiman ^{[2
]}

Detcheverry, Francois A. ^{[2
]}

Dobisz, Elizabeth ^{[1
]}

Kercher, Dan S. ^{[1
]}

Albrecht, Thomas R. ^{[1
]}

de Pablo, Juan J. ^{[2
]}

Nealey, Paul F. ^{[2
]}

机构：

[1] Hitachi Global Storage Technol, San Jose Res Ctr, San Jose, CA 95135 USA

[2] Univ Wisconsin, Dept Biol & Chem Engn, Madison, WI 53706 USA

来源：

SCIENCE | 2008年 / 321卷 / 5891期

关键词：

D O I：

10.1126/science.1157626

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self- assembly are small, and low- energy defects can get easily trapped. We directed the assembly of defect- free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.

引用

页码：936 / 939

页数：4

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