InP/GaAs self-assembled nanostructures: Modelization and experiment

被引:13
作者
Berti, M
Drigo, AV
Giuliani, A
Mazzer, M
Camporese, A
Rossetto, G
Torzo, G
机构
[1] UNIV LONDON IMPERIAL COLL SCI TECHNOL & MED,DEPT MAT,LONDON SW7 2AZ,ENGLAND
[2] CNR,INST CHIM & TECNOL INNOVAT & MAT AVANZATI,I-35127 PADUA,ITALY
[3] UNIV PADUA,IST INGN GESTIONALE,I-36100 VICENZA,ITALY
关键词
D O I
10.1063/1.362944
中图分类号
O59 [应用物理学];
学科分类号
摘要
The initial stages of the three-dimensional metal organic vapor phase epitaxy growth of InP/GaAs have been studied by atomic force microscopy and Rutherford backscattering. The results are compared with the predictions of an equilibrium model that predicts an in-plane critical size for island formation. At low growth rates the model fits well the experiments while it needs to be further developed to include kinetic effects at higher growth rates. The experiments indicate a Stranski-Krastanow growth mode with a critical thickness of 2.1 ML. (C) 1996 American Institute of Physics.
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页码:1931 / 1933
页数:3
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