Structural and optical characterization of DC magnetron sputtered molybdenum oxide films

被引：5

作者：

Nirupama, V. ^{[1
]}

Reddy, P. Sreedhara ^{[1
]}

Hussain, O. M. ^{[1
]}

Uthanna, S. ^{[1
]}

机构：

[1] Sri Venkateswara Univ, Dept Phys, Tirupati 517502, Andhra Pradesh, India

来源：

IONICS | 2007年 / 13卷 / 06期

关键词：

molybdenum trioxide; magnetron sputtering; thin films; structure; optical properties;

D O I：

10.1007/s11581-007-0132-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin films of molybdenum trioxide were deposited on glass substrates employing direct current (DC) magnetron sputtering by sputtering of molybdenum at different oxygen partial pressures in the range 8 x 10(-5) -1 x 10(-3) mbar and at a substrate temperature of 473 K. The glow discharge characteristics of magnetron cathode target of molybdenum were studied. The influence of oxygen partial pressure on the structural and optical properties of molybdenum trioxide films was investigated. The films formed at an optimum oxygen partial pressure of 2 x 10(-4) mbar were polycrystalline in nature with orthorhombic alpha- phase and an optical band gap of 3.16 eV. The refractive index of the films formed at an oxygen partial pressure of 2 x 10(-4) mbar decreased from 2.08 to 1.89 with increase of wavelength from 450 to 1,000 nm, respectively.

引用

页码：451 / 454

页数：4

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