Direct observation of different equilibrium Ga adlayer coverages and their desorption kinetics on GaN (0001) and (000(1)over-bar) surfaces -: art. no. 035325

被引:90
作者
Koblmüller, G [1 ]
Averbeck, R
Riechert, H
Pongratz, P
机构
[1] Infineon Technol AG, Corp Res Photon, D-81730 Munich, Germany
[2] Vienna Univ Technol, Inst Solid State Phys, A-1040 Vienna, Austria
来源
PHYSICAL REVIEW B | 2004年 / 69卷 / 03期
关键词
D O I
10.1103/PhysRevB.69.035325
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a Ga adsorption study of both polar GaN (0001) and (000(1) over bar) surfaces using line-of-sight quadrupole mass spectrometry as a quantitative in situ method. Monitoring the desorbing Ga atoms, two characteristic desorption regimes (exponential and steady-state regimes) were found that are assigned to the formation of a thin equilibrium Ga adlayer and Ga droplets on top of it. The Ga adlayer coverage differs substantially between the two surface polarities, being 1.1 monolayers on (00(1) over bar) GaN and 2.4 monolayers on (0001) GaN. Additional temperature-dependent measurements of the surface lifetime of Ga adatoms unveil fundamental differences in the adsorbate-substrate binding energetics both for the Ga adlayers on the two surface polarities and for the Ga droplets.
引用
收藏
页数:9
相关论文
共 46 条
[1]   Gallium adsorption on (0001) GaN surfaces [J].
Adelmann, C ;
Brault, J ;
Mula, G ;
Daudin, B ;
Lymperakis, L ;
Neugebauer, J .
PHYSICAL REVIEW B, 2003, 67 (16)
[2]   Dynamically stable gallium surface coverages during plasma-assisted molecular-beam epitaxy of (0001) GaN [J].
Adelmann, C ;
Brault, J ;
Jalabert, D ;
Gentile, P ;
Mariette, H ;
Mula, G ;
Daudin, B .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (12) :9638-9645
[3]   INTERACTION OF GA AND AS2 MOLECULAR BEAMS WITH GAAS SURFACES [J].
ARTHUR, JR .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (08) :4032-&
[4]  
Barin I., 2008, Thermochemical Data of Pure Substances, VThird
[5]  
Chopra K. L., 1969, Thin Films Phenomena
[6]   BIRTH DEATH MODELS OF EPITAXY .1. DIFFRACTION OSCILLATIONS FROM LOW INDEX SURFACES [J].
COHEN, PI ;
PETRICH, GS ;
PUKITE, PR ;
WHALEY, GJ ;
ARROTT, AS .
SURFACE SCIENCE, 1989, 216 (1-2) :222-248
[7]  
Crawford D, 1996, MRS INTERNET J N S R, V1, pU96
[8]   Polarity determination of GaN films by ion channeling and convergent beam electron diffraction [J].
Daudin, B ;
Rouviere, JL ;
Arlery, M .
APPLIED PHYSICS LETTERS, 1996, 69 (17) :2480-2482
[9]   Gallium incorporation kinetics during gas source molecular beam epitaxy growth of GaN [J].
Evans, KR ;
Lei, T ;
Jones, CR .
SOLID-STATE ELECTRONICS, 1997, 41 (02) :339-343
[10]   The effect of growth environment on the morphological and extended defect evolution in GaN grown by metalorganic chemical vapor deposition [J].
Fini, P ;
Wu, X ;
Tarsa, EJ ;
Golan, Y ;
Srikant, V ;
Keller, S ;
Denbaars, SP ;
Speck, JS .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (08) :4460-4466