Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation

被引：40

作者：

Boscher, Nicolas D. ^{[1
,2
]}

Wang, Minghui ^{[1
]}

Perrotta, Alberto ^{[3
]}

Heinze, Katja ^{[4
]}

Creatore, Mariadriana ^{[3
]}

Gleason, Karen K. ^{[1
]}

机构：

[1] MIT, Dept Chem Engn, 77 Massachusetts Ave, Cambridge, MA 02139 USA

[2] Luxembourg Inst Sci & Technol, Dept Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

[3] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

[4] Johannes Gutenberg Univ Mainz, Inst Inorgan & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany

来源：

ADVANCED MATERIALS | 2016年 / 28卷 / 34期

关键词：

free-radical polymerization; gas separation; iPECVD; metalloporphyrins; metal-organic covalent networks; MOLECULAR-SIEVE; CROSS-LINKING; THIN-FILMS; PERMEATION; PORPHYRIN; MEMBRANES; SELECTIVITY; POLYMERS; GRAPHENE; MONOMERS;

D O I：

10.1002/adma.201601010

中图分类号：

O6 [化学];

学科分类号：

070301 [无机化学];

摘要：

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal-organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

引用

页码：7479 / 7485

页数：7

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