Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering

被引:41
作者
Fenker, M
Balzer, M
Kappl, H
Banakh, O
机构
[1] FEM, Dept POT, D-73525 Schwabisch Gmund, Germany
[2] EIAJ, Inst Appl Sci, Le Locle, Switzerland
关键词
X-ray diffraction; hardness; reactive magnetron sputtering; nitrides; colour; oxidation behaviour;
D O I
10.1016/j.surfcoat.2005.01.075
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
(Ti,Mg)N coatings were deposited onto high speed steel (HSS) and glass substrates using reactive dc magnetron sputtering. Because of the addition of Mg to TiN the colour changed from golden to violet and metallic blue as measured by spectrophotometry. The chemical composition, morphology and structure of the coatings was investigated by energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively. The addition of Mg to TiN leads to a shift of the TiN peaks in the XRD patterns. Probably, this is due to the substitution of titanium atoms by the bigger magnesium atoms. The indentation hardness and the open-circuit-potential (in NaCl solution) of the (Ti,Mg)N coatings is decreasing with increasing Mg contents. The oxidation resistance of (Ti,Mg)N coatings could be drastically improved with increasing Mg content. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:227 / 231
页数:5
相关论文
共 10 条
[1]   Spectroellipsometric evaluation of colour and oxidation resistance of TiMgN coatings [J].
Banakh, O ;
Balzer, M ;
Fenker, M ;
Blatter, A .
THIN SOLID FILMS, 2004, 455 :650-655
[2]  
BOUIX MH, 2000, 43 ANN TECHN C P, P52
[3]  
*CIE, 1978, CIE PUBL, V12, P2
[4]   Mechanical properties and oxidation resistance of nanocomposite TiN-SiNx physical-vapor-deposited thin films [J].
Diserens, M ;
Patscheider, J ;
Lévy, F .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :158-165
[5]   ON STRUCTURE AND PROPERTIES OF SPUTTERED TI AND AL BASED HARD COMPOUND FILMS [J].
KNOTEK, O ;
BOHMER, M ;
LEYENDECKER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2695-2700
[6]   Formation and oxidation properties of (Ti1-xAlx)N thin films prepared by dc reactive sputtering [J].
Matsui, Y ;
Hiratani, M ;
Nakamura, Y ;
Asano, I ;
Yano, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (03) :605-611
[7]  
MUNZ WD, 1986, J VAC SCI TECHNOL A, V4, P2717, DOI 10.1116/1.573713
[8]   High temperature oxidation behaviour of (Ti1-xCrx)N coatings [J].
Otani, Y ;
Hofmann, S .
THIN SOLID FILMS, 1996, 287 (1-2) :188-192
[9]   PROPERTIES OF (TI1-XALX)N COATINGS FOR CUTTING TOOLS PREPARED BY THE CATHODIC ARC ION PLATING METHOD [J].
TANAKA, Y ;
GUR, TM ;
KELLY, M ;
HAGSTROM, SB ;
IKEDA, T ;
WAKIHIRA, K ;
SATOH, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1992, 10 (04) :1749-1756
[10]  
1951, GMEHLINS HDB ANORGAN