PROPERTIES OF (TI1-XALX)N COATINGS FOR CUTTING TOOLS PREPARED BY THE CATHODIC ARC ION PLATING METHOD

被引:117
作者
TANAKA, Y
GUR, TM
KELLY, M
HAGSTROM, SB
IKEDA, T
WAKIHIRA, K
SATOH, H
机构
[1] STANFORD UNIV, CTR MAT RES, STANFORD, CA 94305 USA
[2] KOBE STEEL LTD, DIV CUTTING TOOL, UOZUMI, AKASHI 674, JAPAN
[3] KOBE STEEL LTD, MAT RES LAB, NISHI KU, KOBE 65122, JAPAN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1992年 / 10卷 / 04期
关键词
D O I
10.1116/1.577742
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
(Ti,Al)N coatings with several Ti/Al ratios were deposited on Si and WC-Co substrates by the cathodic arc ion plating method. The crystal structure was found to be cubic B1 type, which is isostructural with the titanium-based nitrides. Morphology of the (Ti0.4Al0.6)N and TiN films was investigated, using transmission and scanning electron microscopy. The films seemed to have a less columnar structure than expected. The (Ti,Al)N films containing less than 75 mol % AlN had higher hardness than for the pure TiN films. Similarly, (Ti,Al)N coatings displayed superior oxidation resistance at elevated temperatures. Overall, (Ti,Al)N coated cutting tools offer significantly better performance characteristics compared to the tools with TiN coatings.
引用
收藏
页码:1749 / 1756
页数:8
相关论文
共 21 条
[1]   HARD COATINGS OF TIN, (TIHF)N AND (TINB)N DEPOSITED BY RANDOM AND STEERED ARC EVAPORATION [J].
BOELENS, S ;
VELTROP, H .
SURFACE & COATINGS TECHNOLOGY, 1987, 33 (1-4) :63-71
[2]   A NEW X-RAY DIFFRACTOMETER DESIGN FOR THIN-FILM TEXTURE, STRAIN, AND PHASE CHARACTERIZATION [J].
FLINN, PA ;
WAYCHUNAS, GA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1749-1755
[3]   TIXAL1-XN FILMS DEPOSITED BY ION PLATING WITH AN ARC EVAPORATOR [J].
FRELLER, H ;
HAESSLER, H .
THIN SOLID FILMS, 1987, 153 :67-74
[4]   MICROSTRUCTURE AND PHYSICAL-PROPERTIES OF POLYCRYSTALLINE METASTABLE TI0.5AL0.5N ALLOYS GROWN BY DC MAGNETRON SPUTTER DEPOSITION [J].
HAKANSSON, G ;
SUNDGREN, JE ;
MCINTYRE, D ;
GREENE, JE ;
MUNZ, WD .
THIN SOLID FILMS, 1987, 153 :55-65
[5]  
HULTMAN L, IN PRESS THIN SOLID
[6]  
IKEDA T, 1991, THIN SOLID FILMS, V195, P99, DOI 10.1016/0040-6090(91)90262-V
[7]   MORPHOLOGY AND PROPERTIES OF SPUTTERED (TI,AL)N LAYERS ON HIGH-SPEED STEEL SUBSTRATES AS A FUNCTION OF DEPOSITION TEMPERATURE AND SPUTTERING ATMOSPHERE [J].
JEHN, HA ;
HOFMANN, S ;
RUCKBORN, VE ;
MUNZ, WD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2701-2705
[8]   ON THE STRUCTURE OF (TI, AL)N-PVD COATINGS [J].
KNOTEK, O ;
LEYENDECKER, T .
JOURNAL OF SOLID STATE CHEMISTRY, 1987, 70 (02) :318-322
[9]   INDUSTRIAL DEPOSITION OF BINARY, TERNARY, AND QUATERNARY NITRIDES OF TITANIUM, ZIRCONIUM, AND ALUMINUM [J].
KNOTEK, O ;
MUNZ, WD ;
LEYENDECKER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2173-2179
[10]   ON STRUCTURE AND PROPERTIES OF SPUTTERED TI AND AL BASED HARD COMPOUND FILMS [J].
KNOTEK, O ;
BOHMER, M ;
LEYENDECKER, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2695-2700