Bright green electroluminescence from Tb3+ in silicon metal-oxide-semiconductor devices -: art. no. 123513

被引:109
作者
Sun, JM
Skorupa, W
Dekorsy, T
Helm, M
Rebohle, L
Gebel, T
机构
[1] Forschungszentrum Rossendorf EV, Inst Beam Phys & Mat Res, D-01314 Dresden, Germany
[2] Nanoparc Geselsch Beschrankter Haftung GmbH, D-01454 Dresden, Germany
关键词
D O I
10.1063/1.1935766
中图分类号
O59 [应用物理学];
学科分类号
摘要
Bright green electroluminescence with luminance up to 2800 cd/m(2) is reported from indium-tin-oxide/SiO2:Tb/Si metal-oxide-semiconductor devices. The SiO2:Tb3+ gate oxide was prepared by thermal oxidation followed by Tb+ implantation. Electroluminescence and photoluminescence properties were studied with variations of the Tb3+ ion concentration and the annealing temperature. The optimized device shows a high external quantum efficiency of 16% and a luminous efficiency of 2.1 lm/W. The excitation processes of the strong green electroluminescence are attributed to the impact excitation of the Tb3+ luminescent centers by hot electrons and the subsequent crossrelaxation from D-5(3) to D-5(4) energy levels. Light-emitting devices with micrometer size fabricated by the standard metal-oxide-semiconductor technology are demonstrated. (c) 2005 American Institute of Physics.
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页数:7
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