Effects of vapor annealing on the properties of the ZnO films prepared by spray pyrolysis

被引:11
作者
Ma, TY [1 ]
Moon, HY
机构
[1] Gyeongsang Natl Univ, Dept Elect Engn, Chinju 660701, South Korea
[2] Gyeongsang Natl Univ, Res Inst Ind Tech, Chinju 660701, South Korea
关键词
D O I
10.1023/A:1008989606049
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Zinc oxide (ZnO) films were deposited on (0001) sapphire substrates from a solution containing zinc acetate. The films were deposited in a vertical type hot wall reactor by the pyrotysis of an aerosol produced by an ultrasonic gene rater. To increase the resistivity of the films, copper doping and annealing in an ambient of water vapor (vapor annealing) were carried out. The resistivity of a 0.5 wt % copper doped ZnO film was around 24 Ohm cm. The vapor annealing resulted in a 10(7)-fold increase in the resistivity. After annealing, the crystallinity of the films was improved, as determined by X-ray diffraction (XRD) analysis and scanning electron microscopy (SEM). All the films annealed at 600 degrees C for 2 h exhibited a strong (002) orientation with a smooth surface The crystallinity, surface morphology, composition and electrical properties of the as-deposited and vapor-annealed films were investigated.
引用
收藏
页码:435 / 439
页数:5
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