High performance, high yield InP DHBT production process for 40 Gbps applications

被引:20
作者
Sawdai, D [1 ]
Kaneshiro, E [1 ]
Gutierrez-Aitken, A [1 ]
Grossman, PC [1 ]
Sato, K [1 ]
Kim, W [1 ]
Leslie, G [1 ]
Eldredge, J [1 ]
Block, T [1 ]
Chin, P [1 ]
Tran, L [1 ]
Oki, AK [1 ]
Streit, DC [1 ]
机构
[1] TRW Co Inc, Space & Elect Grp, Redondo Beach, CA 90278 USA
来源
2001 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS | 2001年
关键词
D O I
10.1109/ICIPRM.2001.929186
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-speed digital logic is essential in diverse applications such as optical communication, frequency synthesizers, and analog-digital conversion. Current research efforts indicate that technologies utilizing heterojunction bipolar transistors (HBTs) are the preferred approach for systems operating at clock frequencies of 40 GHz and above. This need for higher performance electronics for space and defense applications has driven the development of InP HBTs at TRW. Consistent and continuous improvements from the baseline MBE structure and process technology have enhanced frequency performance, breakdown voltage, producibility, yield, and device reliability such that InP HBTs are being used successfully for many commercial, space, and defense applications (1, 2). This paper describes our optimized high-yield production InP DHBT process which simultaneously combines f(T) > 170 GHz, f(max) > 190 GHz, and breakdown voltage similar to 7 V.
引用
收藏
页码:493 / 496
页数:4
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