Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure

被引:148
作者
Dong, Xiaochen [2 ]
Wang, Peng [2 ]
Fang, Wenjing [3 ]
Su, Ching-Yuan [4 ]
Chen, Yu-Hsin [4 ]
Li, Lain-Jong [4 ]
Huang, Wei [2 ]
Chen, Peng [1 ]
机构
[1] Nanyang Technol Univ, Sch Chem & Biomed Engn, Singapore 637459, Singapore
[2] NUPT, IAM, KLOEID, Nanjing 210046, Peoples R China
[3] Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore
[4] Acad Sinica, Res Ctr Appl Sci, Taipei 11529, Taiwan
基金
美国国家科学基金会; 新加坡国家研究基金会;
关键词
LARGE-AREA; LAYER GRAPHENE; SINGLE; SUBSTRATE; GRAPHITE;
D O I
10.1016/j.carbon.2011.04.069
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Large-sized thin-films composed of single- and few-layered graphene have been synthesized by chemical vapor deposition (CVD) on copper foils under atmospheric pressure using ethanol or pentane as the precursor. Confocal Raman measurements, transmission electron microscopy and scanning tunneling microscopy show that the majority part of the obtained films exhibit hexagonal graphene lattice. Optical microscopy and electrical measurements confirm the continuity of these films. It is also found that the CVD-grown graphene films with ethanol as the precursor exhibit lower defect density, higher electrical conductivity, and higher hall mobility than those grown with pentane as the precursor. This liquid-precursor-based atmospheric pressure CVD synthesis provides a new route for simple, inexpensive and safe growth of graphene thin-films. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:3672 / 3678
页数:7
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