Carrier lifetime measurements using free carrier absorption transients. I. Principle and injection dependence

被引:112
作者
Linnros, J [1 ]
机构
[1] Royal Inst Technol, Dept Elect, S-16440 Kista, Sweden
关键词
D O I
10.1063/1.368024
中图分类号
O59 [应用物理学];
学科分类号
摘要
A contactless, all-optical technique for semiconductor charge carrier lifetime characterization is reviewed. The technique is based upon measurements of free carrier absorption transients by an infrared probe beam following electron-hole pair excitation by a pulsed laser beam. Main features are a direct probing of the excess carrier density coupled with a homogeneous carrier distribution within the sample, enabling precision studies of different recombination mechanisms. We show that the method is capable of measuring the lifetime over a broad range of injections (10(13)-10(18) cm(-3)) probing both the minority carrier lifetime, the high injection lifetime and Auger recombination, as well as the transition between these ranges. Performance and limitations of the technique, such as lateral resolution, are addressed while application of the technique for lifetime mapping and effects of surface recombination is outlined in a companion article [J. Appl. Phys. 84, 284 (1998), part IT]. Results from detailed studies of the injection dependence yield good agreement with the Shockley-Read-Hall theory, whereas the coefficient for Auger recombination shows an apparent shift to a higher value, with respect to the traditionally accepted value, at carrier densities below similar to 2-5 X 10(17) cm(-3). Data also indicate an increased value of the coefficient for bimolecular recombination (radiative or trap-assisted Auger) from the generally accepted value. Measurements on an electron irradiated wafer and wafers of exceptionally high carrier lifetimes are also discussed within the framework; of different recombination mechanisms. (C) 1998 American Institute of Physics.
引用
收藏
页码:275 / 283
页数:9
相关论文
共 37 条
[1]  
BALIGA BJ, 1987, MODERN POWER DEVICES
[2]   MEASUREMENT OF CHARGE-CARRIER BEHAVIOR IN PIN DIODES USING A LASER TECHNIQUE [J].
COOPER, RW ;
PAXMAN, DH .
SOLID-STATE ELECTRONICS, 1978, 21 (06) :865-869
[3]   AUGER COEFFICIENTS FOR HIGHLY DOPED AND HIGHLY EXCITED SILICON [J].
DZIEWIOR, J ;
SCHMID, W .
APPLIED PHYSICS LETTERS, 1977, 31 (05) :346-348
[4]   RADIATIVE RECOMBINATION RATE IN SILICON [J].
GERLACH, W ;
SCHLANGENOTTO, H ;
MAEDER, H .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1972, 13 (01) :277-+
[5]   INJECTION-LEVEL-DEPENDENT RECOMBINATION VELOCITIES AT THE SI-SIO2 INTERFACE FOR VARIOUS DOPANT CONCENTRATIONS [J].
GLUNZ, SW ;
SPROUL, AB ;
WARTA, W ;
WETTLING, W .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (03) :1611-1615
[6]   CHARACTERIZATION OF SI WAFER BONDING BY INJECTION-DEPENDENT RECOMBINATION VELOCITY [J].
GRIVICKAS, V ;
THUNGSTROM, G ;
BIKBAJEVAS, V ;
LINNROS, J ;
NOREIKA, D .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1995, 34 (7A) :L806-L809
[7]   A STUDY OF CARRIER LIFETIME IN SILICON BY LASER-INDUCED ABSORPTION - A PERPENDICULAR GEOMETRY MEASUREMENT [J].
GRIVICKAS, V ;
LINNROS, J ;
VIGELIS, A ;
SECKUS, J ;
TELLEFSEN, JA .
SOLID-STATE ELECTRONICS, 1992, 35 (03) :299-310
[8]   Fourier transient grating in semiconductors with nonlinear carrier recombination [J].
Grivickas, V ;
Noreika, D ;
Linnros, J ;
Tellefsen, JA .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1996, 11 (11) :1725-1733
[9]   NEW CONTACTLESS METHOD FOR CARRIER DIFFUSION MEASUREMENTS IN SILICON WITH A HIGH-PRECISION [J].
GRIVICKAS, V ;
LINNROS, J .
APPLIED PHYSICS LETTERS, 1991, 59 (01) :72-74
[10]  
GRIVICKAS V, 9407 TRITA FTE