Absolute potential measurements inside microwave digital IC's using a micromachined photoconductive sampling probe

被引:8
作者
David, G [1 ]
Yun, TY
Crites, MH
Whitaker, JF
Weatherford, TR
Jobe, K
Meyer, S
Bustamante, MJ
Goyette, B
Thomas, S
Elliott, KR
机构
[1] Univ Michigan, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
[3] USN, Postgrad Sch, Dept Elect & Comp Engn, Monterey, CA 93943 USA
[4] Hughes Space & Commun Co, Hughes Elect Corp, El Segundo, CA 90009 USA
[5] LLC, HRL Labs, Malibu, CA 90765 USA
基金
美国国家科学基金会;
关键词
integrated-circuit testing; microwave measurements; nondestructive testing; photoconductive measurements; time-domain measurements; voltage measurement;
D O I
10.1109/22.739220
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A measurement system for internal node testing of integrated circuits using a micromachined photoconductive sampling probe is described and characterized, Special emphasis is placed upon the system performance, demonstrating how absolute voltage measurements are achieved in a dc-to-mm-wave bandwidth, The feasibility of the setup is illustrated using an InP heterojunction bipolar transistor frequency divider. Detailed waveforms at different circuit nodes and the corresponding propagation delays from within this circuit at operating frequencies up to 10 GHz are presented. The results demonstrate for the first time the use of photoconductive probes for calibration-free, absolute-voltage, de-coupled potential measurements in high-frequency and high-speed integrated circuits.
引用
收藏
页码:2330 / 2337
页数:8
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