Velocity distributions in magnetron sputter

被引:36
作者
Shon, CH [1 ]
Lee, JK
Lee, HJ
Yang, Y
Chung, TH
机构
[1] Pohang Univ Sci & Technol, Pohang 790784, South Korea
[2] Dong A Univ, Pusan 604714, South Korea
关键词
kinetic simulation; magnetron; sheath; sputter; velocity distribution;
D O I
10.1109/27.747881
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Results of the particle simulation of magnetron sputter are presented. Using a kinetic code, we obtain the spatial profiles of plasma density, potential, and velocity distribution function, along with the electron temperature, the ion density, the current density, and the deposition profiles at the anode surface. The result of simulation is compared with the Child-Langmuir law applied to the magnetron discharge and the global model. The velocity distribution function of electrons is Maxwellian, but that of ions is non-Maxwellian near the cathode with the majority in the energy range below 50 eV.
引用
收藏
页码:1635 / 1644
页数:10
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