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The study of electrical characteristics of heterojunction based on ZnO nanowires using ultrahigh-vacuum conducting atomic force microscopy
被引:63
作者:
He, J. H.
[1
]
Ho, C. H.
机构:
[1] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 106, Taiwan
[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 106, Taiwan
关键词:
D O I:
10.1063/1.2821831
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The electrical performances of the heterojunction of n-ZnO nanowires with p-Si substrate at the nanometer scale have been characterized using an ultrahigh-vacuum conducting atomic force microscopy. Compared with the expected values of 1.0-2.0 reported in p-n junction in the previous studies, the abnormally high diode ideality factor (> 2) was obtained. It elucidates that a ZnO-Si p-n junction can be modeled by a series of diodes, the actual ZnO-Si junction diode and two Schottky diodes at the metal/ZnO and metal/Si junctions. The tunneling across p-n junction would also play a role in the externally measured high ideality factor. (c) 2007 American Institute of Physics.
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