F2-lasers:: High-resolution optical processing system for shaping photonic components

被引：18

作者：

Herman, PR ^{[1
]}

Chen, KP ^{[1
]}

Wei, M ^{[1
]}

Zhang, J ^{[1
]}

Ihlemann, J ^{[1
]}

Schäfer, D ^{[1
]}

Marowsky, G ^{[1
]}

Oesterlin, P ^{[1
]}

Burghardt, B ^{[1
]}

机构：

[1] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada

来源：

LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING VI | 2001年 / 4274卷

关键词：

F-2; laser; laser micromachining; photosensitivity; refractive index; photonics fabrication; optical system;

D O I：

10.1117/12.432547

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A high-resolution 157-nm optical system has been developed for the first time to microprocess optical materials with record short-wavelength F-2-laser radiation. The F-2-laser photons drive strong material interactions in silica glasses for microsculpting surfaces and for imprinting internal refractive index structures. The high-resolution optics delivers a homogenized beam of high on-target fluence (similar to2.5 J/cm(2)) for ablation of fused silica and other wide bandgap optical materials. The system resolution is approaching 1-micron lateral and < 100-nm depth - sub-wavelength features appropriate for defining optical communication components at 1.55-mum wavelength. This paper describes this novel processing system and offers prospects for F-2-laser microfabrication and trimming of photonic components in the telecommunication and general optics manufacturing fields.

引用

页码：149 / 157

页数：3

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