Dopant distribution in grain-boundary films in calcia-doped silicon nitride ceramics

被引:81
作者
Gu, H [1 ]
Pan, XQ
Cannon, RM
Rühle, M
机构
[1] Japan Sci & Technol Corp, Ceram Superplast Project, Nagoya, Aichi 456, Japan
[2] Max Planck Inst Met Forsch, D-70174 Stuttgart, Germany
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
关键词
D O I
10.1111/j.1151-2916.1998.tb02747.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Quantitative analyses of the local chemistry of amorphous films at the grain boundary (GB) were taken on hot isostatically pressed high-purity Si3N4 doped with various amounts of calcium (up to 450 ppm), This work was mainly accomplished by using spatially resolved electron energy-loss spectroscopy (EELS) in a dedicated scanning transmission electron microscope. The amount of calcium segregation, quantified in terms of GB excess, saturated in the films at a bulk-doping level of similar to 220 ppm. Extra additives did not stay at the triple-point glass pockets, where the calcium was almost expelled completely; instead, the additives stayed at intersections between the films and pockets. Otherwise, the calcium distribution was uniform along and across GB films, The latter was determined from simulations of EELS profiling. At grain/pocket interfaces, a much-lower segregation level occurred, ranging from one-half to one-tenth of the level at the GB. This observation indicates different segregation mechanisms in the two cases, Also, the calcium segregation in GB films changed the film composition dramatically, because more N3- ions were introduced and replaced O2- ions, to maintain the local stoichiometry. Reduction of the Van der Waals force has been proposed as being the origin of the film expansion with increasing calcium content.
引用
收藏
页码:3125 / 3135
页数:11
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