Micro-discharge noise and radiation damage of silicon microstrip sensors

被引:18
作者
Ohsugi, T
Iwata, Y
Ohyama, H
Ohmoto, T
Yoshikawa, M
Handa, T
Kurino, K
Fujita, K
Kitabayashi, H
Tamura, N
Hatakenaka, T
Maeohmichi, M
Takahata, M
Nakao, M
Iwasaki, H
Kohriki, T
Terada, S
Unno, Y
Takashima, R
Yamamoto, K
Yamamura, K
机构
[1] OKAYAMA UNIV,OKAYAMA 700,JAPAN
[2] KYOTO UNIV,KYOTO,JAPAN
[3] HAMAMATSU PHOTON KK,HAMAMATSU,SHIZUOKA 435,JAPAN
[4] NATL LAB HIGH ENERGY PHYS,KEK,TSUKUBA,IBARAKI 305,JAPAN
关键词
D O I
10.1016/S0168-9002(96)00692-4
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have examined experimentally some existing ideas for improving the radiation hardness of silicon microstrip sensors. We confirm that the extended electrode and the deep implant-strip proposed on the basis of simulation studies works effectively to suppress micro-discharge as well as junction breakdown of the bias or guard ring. For an integrated coupling capacitor a double layer structure of SiO2 and Si3N4 provides better radiation hardness than that of single SiO2 coupling in our design conditions. The onset voltage of the micro-discharge on the bias/guard ring has been studied for an extended electrode and a floating guard ring.
引用
收藏
页码:166 / 173
页数:8
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