Patterned magnetic permalloy and nickel films: Fabrication by electron beam and x-ray lithographic techniques

被引：9

作者：

Candeloro, P

Gerardino, A

Di Fabrizio, E

Cabrini, S

Giannini, G

Mastrogiacomo, L

Ciria, M

O'Handley, RC

Gubbiotti, G

Carlotti, G

机构：

[1] Univ Perugia, Dipartimento Fis, INFM, I-06100 Perugia, Italy

[2] CNR, IESS, Ist Elettron Stato Solido, I-00156 Rome, Italy

[3] INFM, TASC, Area Ricerca, I-43100 Parma, Italy

[4] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2002年 / 41卷 / 08期

关键词：

e-beam and X-ray lithographies; chemical amplified resists; magneto-optic Kerr effect magnetometry; brillouin light scattering;

D O I：

10.1143/JJAP.41.5149

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 x 1) mm(2). Dot dimensions and spacings range from 500 nm to 1 mum and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning, have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.

引用

页码：5149 / 5152

页数：4

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