Interaction of silicon dangling bonds with insulating surfaces

被引:23
作者
Foster, AS
Gal, AY
Gale, JD
Lee, YJ
Nieminen, RM
Shluger, AL
机构
[1] Helsinki Univ Technol, Phys Lab, Helsinki 02015, Finland
[2] UCL, Dept Phys & Astron, London WC1E 6BT, England
[3] Curtin Univ Technol, Dept Appl Chem, Nanotechnol Res Inst, Perth, WA 6845, Australia
关键词
D O I
10.1103/PhysRevLett.92.036101
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We use first principles density functional theory calculations to study the interaction of a model dangling bond silicon tip with the surfaces of CaF(2), Al(2)O(3), TiO(2), and MgO. In each case the strongest interaction is with the highest anions in the surface. We show that this is due to the onset of chemical bonding with the surface anions, which can be controlled by an electric field across the system. Combining our results and previous studies on semiconductor surfaces suggests that using dangling bond Si tips can provide immediate identification of surface species in atomically resolved noncontact atomic force microscopy and facilitate selective measurements of short-range interactions with surface sites.
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页数:4
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