Atomic resolution imaging and frequency versus distance measurements on NiO(001) using low-temperature scanning force microscopy -: art. no. 085402

被引:32
作者
Hoffmann, R
Lantz, MA
Hug, HJ
van Schendel, PJA
Kappenberger, P
Martin, S
Baratoff, A
Güntherodt, HJ
机构
[1] Univ Basel, Inst Phys, CH-4056 Basel, Switzerland
[2] IBM Corp, Zurich Res Lab, Res, CH-8803 Ruschlikon, Switzerland
来源
PHYSICAL REVIEW B | 2003年 / 67卷 / 08期
关键词
D O I
10.1103/PhysRevB.67.085402
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atomically resolved scanning force microscopy images and force versus distance measurements at low temperatures on a cleaved NiO (001) single crystal are reported. The force-distance data are well modeled with a capacitive force in the distance range of 0.5 to 20 nm. The residual forces at smaller tip-sample distances show a maximum attraction of 2.3 nN and decay within 0.2 nm. They show a steplike behavior associated with an increase in dissipation signal. This steplike behavior can be explained by interaction of more than one atom of the tip or of the surface.
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页数:6
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