Low pressure magnetron sputtering and selfsputtering discharges

被引:41
作者
Kadlec, S [1 ]
Musil, J [1 ]
机构
[1] ACAD SCI CZECH REPUBL,INST PHYS,CR-18040 PRAGUE 8,CZECH REPUBLIC
关键词
D O I
10.1016/0042-207X(96)80013-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Operation of three magnetrons with diameters 100 - 160 mm have been measured at pressures below 0.1 Pa. At low and medium discharge power density less than or equal to 10W/cm(2), stable discharge has been achieved down to the Ar pressure range (1.1-2) x 10(-2) Pa. Discharge characteristics of selfsputtering discharges have been measured in the range of target power densities 2 W/cm(2) to 100 W/cm(2). Selfsputtering of Cu was achieved at power density 57 W/cm(2). Selfsputtering was observed on other five target materials: Ag, Pb, Cd, brass and on Al bronze.
引用
收藏
页码:307 / 311
页数:5
相关论文
共 25 条
[11]   RF AND DC DISCHARGE CHARACTERISTICS FOR OPPOSED-TARGETS SPUTTERING [J].
MATSUOKA, M ;
HOSHI, Y ;
NAOE, M .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (06) :2096-2102
[12]  
MURALIDHAR GK, UNPUB REV SCI INSTRU
[13]   MASS AND ENERGY-RESOLVED DETECTION OF IONS AND NEUTRAL SPUTTERED SPECIES INCIDENT AT THE SUBSTRATE DURING REACTIVE MAGNETRON SPUTTERING OF TI IN MIXED AR+N2 MIXTURES [J].
PETROV, I ;
MYERS, A ;
GREENE, JE ;
ABELSON, JR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (05) :2846-2854
[14]   MECHANISMS OF THE BIASED SPUTTERING OF TITANIUM IN AN AR-N2 MIXTURE [J].
POITEVIN, JM ;
LEMPERIERE, G .
THIN SOLID FILMS, 1984, 120 (03) :223-230
[15]   LOW-PRESSURE MAGNETRON SPUTTERING USING IONIZED, SPUTTERED SPECIES [J].
POSADOWSKI, W .
SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3) :290-292
[16]   SUSTAINED SELF-SPUTTERING USING A DIRECT-CURRENT MAGNETRON SOURCE [J].
POSADOWSKI, WM ;
RADZIMSKI, ZJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (06) :2980-2984
[17]  
POSADOWSKI WM, COMMUNICATION
[18]   METAL-ION DEPOSITION FROM IONIZED MAGNETRON SPUTTERING DISCHARGE [J].
ROSSNAGEL, SM ;
HOPWOOD, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01) :449-453
[19]   OPTICAL-EMISSION IN MAGNETRONS - NONLINEAR ASPECTS [J].
ROSSNAGEL, SM ;
SAENGER, KL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :968-971
[20]   GAS-DENSITY REDUCTION EFFECTS IN MAGNETRONS [J].
ROSSNAGEL, SM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (01) :19-24