MECHANISMS OF THE BIASED SPUTTERING OF TITANIUM IN AN AR-N2 MIXTURE

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS [J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27

[2] Bondarenko A. V., 1973, Soviet Physics - Technical Physics, V18, P515

[3] MEASUREMENT OF RATES OF CHARGE-EXCHANGE AND DISSOCIATIVE RECOMBINATION REACTIONS IN AR-N2, AR-H2 AND AR-O2 MIXTURES [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1977, 25 (02): : 211 - 227

[4] REACTIONS OF SINGLY AND DOUBLY CHARGED ARGON IONS WITH N2 AND O2 IN A STEADY-STATE HOLLOW-CATHODE DISCHARGE [J]. JOURNAL OF CHEMICAL PHYSICS, 1978, 68 (03) : 804 - 811

[5] ABSOLUTE CROSS-SECTIONS FOR BEAM-SURFACE REACTIONS - N-2+ ON TI FROM 0.25 TO 3.0 KEV KINETIC-ENERGY [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (04) : 2247 - 2255

[6] STRUCTURE AND ELECTRICAL-PROPERTIES OF TITANIUM NITRIDE FILMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (01) : 85 - 96

[7] LABORIE P, 1971, SECTIONS EFFICACES E

[8] CHEMICAL-REACTIONS OF N2+ ION-BEAMS WITH 1ST-ROW TRANSITION-METALS [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1979, 83 (02) : 209 - 212

[9] INFLUENCE OF THE NITROGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC-SPUTTERED TITANIUM AND TITANIUM NITRIDE FILMS [J]. THIN SOLID FILMS, 1984, 111 (04) : 339 - 349

[10] INFLUENCE OF SUBSTRATE BIAS ON THE COMPOSITION, STRUCTURE AND ELECTRICAL-PROPERTIES OF REACTIVELY DC-SPUTTERED TIN FILMS [J]. THIN SOLID FILMS, 1982, 97 (01) : 69 - 77

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS [J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27

[2] Bondarenko A. V., 1973, Soviet Physics - Technical Physics, V18, P515

[3] MEASUREMENT OF RATES OF CHARGE-EXCHANGE AND DISSOCIATIVE RECOMBINATION REACTIONS IN AR-N2, AR-H2 AND AR-O2 MIXTURES [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1977, 25 (02): : 211 - 227

[4] REACTIONS OF SINGLY AND DOUBLY CHARGED ARGON IONS WITH N2 AND O2 IN A STEADY-STATE HOLLOW-CATHODE DISCHARGE [J]. JOURNAL OF CHEMICAL PHYSICS, 1978, 68 (03) : 804 - 811

[5] ABSOLUTE CROSS-SECTIONS FOR BEAM-SURFACE REACTIONS - N-2+ ON TI FROM 0.25 TO 3.0 KEV KINETIC-ENERGY [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (04) : 2247 - 2255

[6] STRUCTURE AND ELECTRICAL-PROPERTIES OF TITANIUM NITRIDE FILMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (01) : 85 - 96

[7] LABORIE P, 1971, SECTIONS EFFICACES E

[8] CHEMICAL-REACTIONS OF N2+ ION-BEAMS WITH 1ST-ROW TRANSITION-METALS [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1979, 83 (02) : 209 - 212

[9] INFLUENCE OF THE NITROGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC-SPUTTERED TITANIUM AND TITANIUM NITRIDE FILMS [J]. THIN SOLID FILMS, 1984, 111 (04) : 339 - 349

[10] INFLUENCE OF SUBSTRATE BIAS ON THE COMPOSITION, STRUCTURE AND ELECTRICAL-PROPERTIES OF REACTIVELY DC-SPUTTERED TIN FILMS [J]. THIN SOLID FILMS, 1982, 97 (01) : 69 - 77