Defects formation in sublimation grown 6H-SiC single crystal boules

被引:15
作者
Madar, R
Anikin, M
Chourou, K
Labeau, M
Pons, M
Blanquet, E
Dedulle, JM
Bernard, C
Milita, S
Baruchel, J
机构
[1] ECOLE NATL SUPER ELECTROCHIM & ELECTROME GRENOBLE,THERMODYNAM & PHYSICOCHIM MET LAB,CNRS,F-38402 ST MARTIN DHER,FRANCE
[2] EUROPEAN SYNCHROTRON RADIAT FACIL,F-38043 GRENOBLE,FRANCE
关键词
silicon carbide; defects; synchrotron radiation;
D O I
10.1016/S0925-9635(97)00068-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A perfect understanding of the origin of defects in connection with crystal growth conditions is of prime importance for the future of SIC based electronic. In the generally used modified Lely method (M-Lely), the growth takes place by incongruent sublimation from SIC powder on a monocrystalline SiC seed at low pressure and high temperature. We have recently proposed beginning the growth process at the inversed sign of temperature gradient and low argon pressure. In these conditions, nucleation at low temperature is suppressed and sublimation polishing etching takes place. Then the sign of the temperature gradient is slowly inversed to start the growth. The influence of this nucleation step on the nature and density of defects has been studied by structural analysis using X-ray diffraction, optical and electronic microscopy, atomic force microscopy and synchrotron white beam X-ray topography. The results are discussed in the light of our present understanding of the sublimation process. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:1249 / 1261
页数:13
相关论文
共 49 条
[21]  
Koga K., 1987, Journal of the Vacuum Society of Japan, V30, P886, DOI 10.3131/jvsj.30.886
[22]   AN OPTICAL AND X-RAY TOPOGRAPHIC STUDY OF GIANT SCREW DISLOCATIONS IN SILICON-CARBIDE [J].
KRISHNA, P ;
JIANG, SS ;
LANG, AR .
JOURNAL OF CRYSTAL GROWTH, 1985, 71 (01) :41-56
[23]  
LELY JA, 1955, BER DENT KERAM GES, V32
[24]   GROWTH-MECHANISM AND DEFECTS IN SIC PREPARED BY SUBLIMATION METHOD [J].
NISHINO, S ;
HIGASHINO, T ;
TANAKA, T ;
SARAIE, J .
JOURNAL OF CRYSTAL GROWTH, 1995, 147 (3-4) :339-342
[25]  
Onoue K, 1996, INST PHYS CONF SER, V142, P65
[26]   COMPUTER MODELING OF SI AND SIC SURFACES AND SURFACE PROCESSES RELEVANT TO CRYSTAL-GROWTH FROM THE VAPOR [J].
PEARSON, E ;
TAKAI, T ;
HALICIOGLU, T ;
TILLER, WA .
JOURNAL OF CRYSTAL GROWTH, 1984, 70 (1-2) :33-40
[27]   MOTION OF PARTIAL DISLOCATION IN SILICON-CARBIDE [J].
PILYANKEVICH, AN ;
BRITUN, VF .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1984, 82 (02) :449-457
[28]   Thermodynamic heat transfer and mass transport modeling of the sublimation growth of silicon carbide crystals [J].
Pons, M ;
Blanquet, E ;
Dedulle, JM ;
Garcon, I ;
Madar, R ;
Bernard, C .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (11) :3727-3735
[29]   X-RAY TOPOGRAPHIC STUDIES OF SIC CRYSTALS GROWN FROM VAPOR-PHASE [J].
RAI, RS ;
SINGH, G ;
SENGUPTA, SP .
JOURNAL OF CRYSTAL GROWTH, 1983, 61 (01) :170-172
[30]  
Rocabois P., 1995, High Temperatures - High Pressures, V27-28, P3, DOI 10.1068/htrt35