The formation of a p-n junction in a polymer electrolyte top-gated bilayer graphene transistor

被引:24
作者
Chakraborty, Biswanath [1 ]
Das, Anindya [1 ]
Sood, A. K. [1 ]
机构
[1] Indian Inst Sci, Dept Phys, Bangalore 560012, Karnataka, India
关键词
BANDGAP;
D O I
10.1088/0957-4484/20/36/365203
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We show simultaneous p- and n-type carrier injection in a bilayer graphene channel by varying the longitudinal bias across the channel and the top-gate voltage. The top gate is applied electrochemically using solid polymer electrolyte and the gate capacitance is measured to be 1.5 mu F cm(-2), a value about 125 times higher than the conventional SiO2 back-gate capacitance. Unlike the single-layer graphene, the drain-source current does not saturate on varying the drain-source bias voltage. The energy gap opened between the valence and conduction bands using top-and back-gate geometry is estimated.
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页数:6
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