A minimum total power methodology for projecting limits on CMOS GSI

被引:42
作者
Bhavnagarwala, AJ [1 ]
Austin, BL [1 ]
Bowman, KA [1 ]
Meindl, JD [1 ]
机构
[1] Georgia Inst Technol, Microelect Res Ctr, Atlanta, GA 30332 USA
关键词
low-voltage CMOS; minimum power CMOS; voltage scaling;
D O I
10.1109/92.845891
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
A circuit design methodology minimizing total power drain of a static complementary metal-oxide-semiconductor (CMOS) random logic network for a prescribed performance, operating temperature range, and short channel threshold voltage rolloff is investigated. Physical, continuous, smooth, and compact "Transregional" MOSFET drain current models that consider high-held effects in scaled devices and permit tradeoffs between saturation drive current and subthreshold leakage current,are employed to model CMOS circuit performance and power dissipation at low voltages. Transregional models are used in conjunction with physical short channel MOSFET threshold voltage rolloff models and stochastic interconnect distributions to project optimal supply voltages, threshold voltages, and device channel widths minimizing total power dissipated by CMOS logic circuits for each National Technology Roadmap for Semiconductors (NTRS) technology generation. Optimum supply voltage, corresponding to minimum total power dissipation, is projected to stale to 510 mV for the 50-nm 10-GHz CMOS generation in the year 2012, Techniques exploiting datapath parallelism to further scale the supply voltage are shown to offer decreasing reductions in power dissipation with technology scaling.
引用
收藏
页码:235 / 251
页数:17
相关论文
共 29 条
[1]  
AGRAWAL B, 1993, P 23 ESSDERC SEPT, P191
[2]  
Bakoglu B., 1990, Circuits, Interconnections, and Packaging for VLSI
[3]  
BURR JB, 1994, ISSCC, P84
[4]  
CHANDRAKASAN A, 1995, LOW POWER DIGITAL CM
[5]   LOW-POWER CMOS DIGITAL DESIGN [J].
CHANDRAKASAN, AP ;
SHENG, S ;
BRODERSEN, RW .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1992, 27 (04) :473-484
[6]  
CHEN J, 1992, IEEE ELECTR DEVICE L, V13, P32
[7]   A stochastic wire-length distribution for gigascale integration (GSI) - Part I: Derivation and validation [J].
Davis, JA ;
De, VK ;
Meindl, JD .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (03) :580-589
[8]  
FRANK DJ, 1997, IEEE 1997 INT S LOW, P31
[9]   A SIMPLE-MODEL FOR SCALED MOS-TRANSISTORS THAT INCLUDES FIELD-DEPENDENT MOBILITY [J].
GARVERICK, SL ;
SODINI, CG .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1987, 22 (01) :111-114
[10]   High-performance microprocessor design [J].
Gronowski, PE ;
Bowhill, WJ ;
Preston, RP ;
Gowan, MK ;
Allmon, RL .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1998, 33 (05) :676-686