Efficient submicron processing of metals with femtosecond UV pulses

被引:42
作者
Békési, J [1 ]
Klein-Wiele, JH [1 ]
Simon, P [1 ]
机构
[1] Laser Lab Gottingen EV, D-37077 Gottingen, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2003年 / 76卷 / 03期
关键词
D O I
10.1007/s00339-002-1820-y
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
The generation of submicron-sized holes on metal surfaces by applying femtosecond UV laser pulses was investigated. Different optical schemes based on a Schwarzschild-type reflective objective were used to reach optimized ablation quality and efficiency in different applications (hole ablation, through-hole drilling, generation of surface patterns consisting of holes, etc.). Submicron-sized holes and hole patterns were ablated onto metal surfaces and drilled through similar to5-mum-thick steel foils with 600-nm diameter on the output side. Using a special optical interferometric method, large-area surface processing of high-conductivity materials in the submicron regime was performed. Combining these techniques with the application of high-repetition-rate ultra-short UV laser sources, large-area sub-mum processing of all kinds of materials in industrial environments is possible.
引用
收藏
页码:355 / 357
页数:3
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