High characteristic temperature of near-1.3-μm InGaAs/GaAs quantum-dot lasers at room temperature

被引:58
作者
Mukai, K [1 ]
Nakata, Y [1 ]
Otsubo, K [1 ]
Sugawara, M [1 ]
Yokoyama, N [1 ]
Ishikawa, H [1 ]
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
关键词
D O I
10.1063/1.126644
中图分类号
O59 [应用物理学];
学科分类号
摘要
This letter reports on the high characteristic temperature of InGaAs/GaAs quantum-dot lasers at room temperature. Self-assembled quantum dots were grown using low-growth-rate molecular-beam epitaxy, and continuous-wave lasing occurred at the dot ground level of 1.26 mu m at 25 degrees C. The characteristic temperature of the threshold currents was 120 K, and ground-level lasing was observed up to 100 degrees C. Comparing the lasing performances and the spontaneous emission spectra with those of 1.3 mu m emission dots, we found that the large volume density, deep potential, and high quantum efficiency were key points for improving the temperature characteristics. (C) 2000 American Institute of Physics. [S0003-6951(00)03523-3].
引用
收藏
页码:3349 / 3351
页数:3
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