Semiconductor microlenses fabricated by one-step wet etching

被引：31

作者：

Kim, YS ^{[1
]}

Kim, J

Choe, JS

Roh, YG

Jeon, H

Woo, JC

机构：

[1] Seoul Natl Univ, Dept Phys, Seoul 151742, South Korea

[2] Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151742, South Korea

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2000年 / 12卷 / 05期

关键词：

chemical etching; diffusion process; microlens; refraction; semiconductor materials;

D O I：

10.1109/68.841268

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We fabricated refractive semiconductor microlenses using a diffusion-limited chemical etching technique based on Br-2 solution. The simple one-step wet etching process produced high-quality microlenses of GaAs and InP, the two most popular compound semiconductor materials used in optoelectronics. A spherical GaAs microlens with a nominal lens diameter of 30 mu m exhibited a radius of curvature and focal length of 91 and 36 mu m, respectively. The surface roughness, examined by atomic force microscopy (AFM), was measured to be below +/-10 Angstrom. This microlens fabrication method should be readily applicable due to the simplicity in processing and the high-quality results.

引用

页码：507 / 509

页数：3

共 9 条

[1] INTEGRATED OPTICAL MODESHAPE ADAPTERS IN INGAASP/INP FOR EFFICIENT FIBER-TO-WAVE-GUIDE COUPLING [J].