Preparation and characterization of platinum black electrodes

被引:55
作者
Ilic, B
Czaplewski, D
Neuzil, P
Stanczyk, T
Blough, J
Maclay, GJ
机构
[1] Univ Illinois, Microfabricat Applicat Labs, Chicago, IL USA
[2] Inst Microelect, Singapore 117685, Singapore
[3] Univ Illinois, Dept Civil & Mat Engn, Chicago, IL USA
关键词
D O I
10.1023/A:1004884723515
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated properties of electrochemically deposited platinum black by atomic force and scanning electron microscopy. Platinum black was deposited on evaporated platinum electrodes. Deposition time and cure temperature was found to influence the quality and morphology of the platinum black layer. Morphological inclusions were readily observed in films deposited for duration of less than 60 seconds at a bias of 1.5 V against a platinum counter electrode. Shorting of the microfabricated electrodes due to lateral outgrowth of high surface area platinum black was observed when current densities on the order of 100 mA cm(-2) were employed. We further show that reproducibility of highly adherent platinized electrodes is achieved. (C) 2000 Kluwer Academic Publishers.
引用
收藏
页码:3447 / 3457
页数:11
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