Properties of gallium- and aluminum-doped bulk ZnO obtained from single-crystals grown by liquid phase epitaxy

被引:24
作者
Kobayashi, Jun [1 ,2 ]
Ohashi, Naoki [1 ,3 ]
Sekiwa, Hideyuki [2 ]
Sakaguchi, Isao [1 ]
Miyamoto, Miyuki [2 ]
Wada, Yoshiki [1 ]
Adachi, Yutaka [1 ]
Matsumoto, Kenji [1 ,3 ]
Haneda, Hajime [1 ,3 ]
机构
[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[2] Mitsubishi Gas Chem Co Ltd, Tokyo Res Lab, Katsushika Ku, Tokyo 1250051, Japan
[3] Kyushu Univ, Dept Appl Sci Elect & Mat, Fukuoka 8168580, Japan
关键词
Doping; Liquid phase epitaxy; Oxides; Semiconducting II-VI materials; THIN-FILM-TRANSISTOR; SUBSTRATE;
D O I
10.1016/j.jcrysgro.2009.07.037
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Bulk properties of gallium (Ga)- and aluminum (Al)-doped zinc oxide (ZnO) were studied using bulky single-crystalline thick films grown by liquid phase epitaxy (LPE). The highest possible dopant concentration was 1 x 10(19) cm(-3) for LPE growth at around 800 degrees C. The electron concentration was nearly same to the Ga and AI concentrations. The donor binding energy decreased to nearly zero with an increase in dopant concentration, and electron mobility of the sample with relatively high dopant concentration (1 x 10(19) cm(-3)) was more than 60 cm(2) V-1 s(-1) at room temperature. The LPE technique is a potential solution for the production of ZnO for optical applications because the well-defined excitonic luminescence could be seen from the LPE-grown-doped single-crystals. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:4408 / 4413
页数:6
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