Block copolymer patterns and templates

被引：199

作者：

Li, Mingqi

Ober, Christopher K.

机构：

[1] Rohm & Haas Elect Mat, Marlborough, MA 01752 USA

[2] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

来源：

MATERIALS TODAY | 2006年 / 9卷 / 09期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/S1369-7021(06)71620-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This review describes the chemical and physical aspects of patternable block copolymers and their use for nanostructure fabrication. The patternability of block copolymers results from their ability to self-assemble into microdomains and the manipulation of these patterns by a variety of physical and chemical means. Procedures for achieving long-range lateral order, as well as orientation order of microdomain patterns, are discussed. The level of control that these strategies afford has enabled block copolymers to be used as templates for fabricating a variety of nanostructures.

引用

收藏

页码：30 / 39

页数：10

相关论文

共 101 条

[1] Selective growth of cobalt nanoclusters in domains of block copolymer films [J].

Abes, JI ;

Cohen, RE ;

Ross, CA .

CHEMISTRY OF MATERIALS, 2003, 15 (05) :1125-1131

[2] ALIGNMENT OF LAMELLAR BLOCK-COPOLYMER MICROSTRUCTURE IN AN ELECTRIC-FIELD .2. MECHANISMS OF ALIGNMENT [J].

AMUNDSON, K ;

HELFAND, E ;

QUAN, XN ;

HUDSON, SD ;

SMITH, SD .

MACROMOLECULES, 1994, 27 (22) :6559-6570

[3] ALIGNMENT OF LAMELLAR BLOCK-COPOLYMER MICROSTRUCTURE IN AN ELECTRIC-FIELD .1. ALIGNMENT KINETICS [J].

AMUNDSON, K ;

HELFAND, E ;

QUAN, X ;

SMITH, SD .

MACROMOLECULES, 1993, 26 (11) :2698-2703

[4] Macroscopic orientation of block copolymer cylinders in single-layer films by shearing [J].

Angelescu, DE ;

Waller, JH ;

Adamson, DH ;

Deshpande, P ;

Chou, SY ;

Register, RA ;

Chaikin, PM .

ADVANCED MATERIALS, 2004, 16 (19) :1736-+

[5] Templating the patterning of gold nanoparticles using a stained triblock copolymer film surface [J].

Ansari, IA ;

Hamley, IW .

JOURNAL OF MATERIALS CHEMISTRY, 2003, 13 (10) :2412-2413

[6] Block copolymers under periodic, strong three-dimensional confinement [J].

Arsenault, AC ;

Rider, DA ;

Tétreault, N ;

Chen, JIL ;

Coombs, N ;

Ozin, GA ;

Manners, I .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2005, 127 (28) :9954-9955

[7] Nano-patterning for patterned media using block-copolymer [J].

Asakawa, K ;

Hiraoka, T ;

Hieda, H ;

Sakurai, M ;

Kamata, Y .

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (03) :465-470

[8] Nanofabrication of integrated magnetoelectronic devices using patterned self-assembled copolymer templates [J].

Bal, M ;

Ursache, A ;

Tuominen, MT ;

Goldbach, JT ;

Russell, TP .

APPLIED PHYSICS LETTERS, 2002, 81 (18) :3479-3481

[9] BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT [J].

BATES, FS ;

FREDRICKSON, GH .

ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) :525-557

[10] Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication [J].

Black, CT ;

Guarini, KW ;

Milkove, KR ;

Baker, SM ;

Russell, TP ;

Tuominen, MT .

APPLIED PHYSICS LETTERS, 2001, 79 (03) :409-411

← 1 2 3 4 5 6 7 8 9 10 →