Carbon-associated Si(001)-c(4 x 4) reconstruction dosed with hydrogen

被引:17
作者
Stoffel, M [1 ]
Simon, L [1 ]
Aubel, D [1 ]
Bischoff, JL [1 ]
Kubler, L [1 ]
机构
[1] LPSE, CNRS, UPRES A 7014, Fac Sci, F-68093 Mulhouse, France
关键词
carbon; hydrogen atom; low energy electron diffraction (LEED); photoelectron diffraction; silicon; silicon carbide; surface relaxation and reconstruction; X-ray photoelectron spectroscopy;
D O I
10.1016/S0039-6028(00)00196-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
It has recently been recognized that initial carbon (C) accommodation on Si(001)-(2 x 1) surfaces (less than 1 monolayer, at 600 degrees C and using various C precursors) causes a c(4 x 4) surface reconstruction. In this paper we intend to determine the C lattice sites associated to this reconstruction. C Is XPS signatures indicate a main contribution of C atoms dominantly located in substitutional subsurface sites and a weaker contribution, of 1.6 eV higher binding energy, attributed to C surface sites. C Is X-ray photoelectron diffraction polar observations along [010] azimuths ascertain C location within the first five Si layers and the C atoms at the origin of the observed angular modulations are necessarily located from the third to fifth subsurface layers. By c(4 x 4) surface exposure to atomic hydrogen at room temperature, a 1 x 1 LEED diagram is restored. As for the Si(001)-(2 x 1) reconstruction, it demonstrates a break of hydrogen-saturated surface dimers. The latter may be restored by annealing but with a kinetics different from that of a simple Si dihydride desorption. These results essentially support c(4 x 4) reconstruction models with surface dimers including C atoms and a subsurface C-rich SinC alloy. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:201 / 206
页数:6
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