Massively parallel dip-pen nanolithography with 55000-pen two-dimensional arrays

被引:243
作者
Salaita, Khalid
Wang, Yuhuang
Fragala, Joseph
Vega, Rafael A.
Liu, Chang
Mirkin, Chad A.
机构
[1] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
[2] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[3] Northwestern Univ, Dept Med, Evanston, IL 60208 USA
[4] Northwestern Univ, Int Inst Nanotechnol, Evanston, IL 60208 USA
[5] Nanolnk Inc, Campbell, CA 95008, Australia
[6] Univ Illinois, Micro & Nanotechnol Lab, Urbana, IL 61801 USA
关键词
dip-pen nanolithography; lithography; nanofabrication; parallelization; scanning probe;
D O I
10.1002/anie.200603142
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
(Figure Presented) Lots of writing on the wall: A simple and flexible approach for performing high-throughput, large-area, direct-write molecular patterning, without tip feedback, is demonstrated by using a 55 000-pen two-dimensional array of atomic force microscope (AFM) cantilevers. The use of low-aspect-ratio pyramidal tips, curved cantilevers, and a novel gravity-driven alignment method allows parallel patterning of molecules across 1-cm2 substrate areas at sub-100-nm resolution. © 2006 Wiley-VCH Verlag GmbH & Co. KGaA.
引用
收藏
页码:7220 / 7223
页数:4
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