Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films

Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Cr1-xAlx alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 degreesC and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7Al0.3N films, annealed at 800 degreesC for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-xAlxN films improved with increasing Al content X. On the other hand, the peaks from Cr1-xAlxN films which were annealed at 800 degreesC did not change at all, but Cr1-xAlxN films were slightly oxidized over 900 degreesC. It is considered that the oxidation resistance of Cr1-xAlxN films was superior to that of Ti1-xAlxN films. (C) 2002 Elsevier Science B.V. All rights reserved.