Enhanced vertical photo-sensitivity in μc-Si:H/a-Si:H superlattices

被引:13
作者
Jun, KH [1 ]
Lim, KS [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Elect Engn, Yusong Gu, Taejon 305701, South Korea
关键词
D O I
10.1016/S0022-3093(99)00615-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The microcrystalline silicon/amorphous silicon (mu c-Si:H/a-Si:H) superlattice showed an enhanced vertical,photo- sensitivity (photo-conductivity/dark-conductivity), whereas it reserved a lateral photo-sensitivity nearly unchanged. The film was fabricated by alternating the mixing of SiH4 and HZ in a photo-chemical vapor deposition system. The fact that a high vertical photo-sensitivity and an obvious crystalline volume fraction can be obtained at the same time distinguishes the mu c-Si:H/a-Si:H superlattice from the bulk mu c-Si:H. The change of the vertical dark-conductivity with the sublayer thickness was explained by the change of the a-Si:PI sublayer's electrical conduction property. We think that the thin a-Si:H sublayers play an important role of perturbing a columnar structure of the mu c-Si:H. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:268 / 272
页数:5
相关论文
共 13 条
[1]   SUBSTRATE SELECTIVITY IN THE FORMATION OF MICROCRYSTALLINE SILICON - MECHANISMS AND TECHNOLOGICAL CONSEQUENCES [J].
CABARROCAS, PRI ;
LAYADI, N ;
HEITZ, T ;
DREVILLON, B ;
SOLOMON, I .
APPLIED PHYSICS LETTERS, 1995, 66 (26) :3609-3611
[2]   Raman scattering spectra and electrical conductivity of thin silicon films with a mixed amorphous-nanocrystalline phase composition: Determination of the nanocrystalline volume fraction [J].
Golubev, VG ;
Davydov, VY ;
Medvedev, AV ;
Pevtsov, AB ;
Feoktistov, NA .
PHYSICS OF THE SOLID STATE, 1997, 39 (08) :1197-1201
[3]   In situ correlation between the optical and electrical properties of thin intrinsic and n-type microcrystalline silicon films [J].
Hamma, S ;
Cabarrocas, PRI .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (11) :7282-7288
[4]  
KOCKA J, 1998, P 2 WORLD C PHOT SOL, P785
[5]   THE DYNAMICS OF PHOTOEXCITED CARRIERS IN MICROCRYSTALLINE SILICON [J].
KOMURO, S ;
AOYAGI, Y ;
SEGAWA, Y ;
NAMBA, S ;
MASUYAMA, A ;
MATSUDA, A ;
TANAKA, K .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (06) :1658-1662
[6]  
KRUANGAM D, 1984, 1 INT PHOT SCI ENG C, P437
[7]   PERSISTENT PHOTOCONDUCTIVITY AND BAND-OFFSET IN MU-C-SI H/A-SIH SUPERLATTICES [J].
LIU, J ;
FENG, LG .
THIN SOLID FILMS, 1993, 235 (1-2) :76-79
[8]  
MEIER J, 1998, P 2 WORLD C PHOT SOL, P375
[9]   PREPARATION OF MU-C-SI-H/A-SI-H MULTILAYERS AND THEIR OPTOELECTRIC PROPERTIES [J].
NAKATA, M ;
SHIRAI, H ;
NAMIKAWA, T ;
SHIMIZU, I .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1990, 29 (06) :1027-1032
[10]   Performance of p-i-n solar cells with intrinsic mu c-Si:H layer [J].
Saitoh, K ;
Ishiguro, N ;
Yanagawa, N ;
Tanaka, H ;
Sadamoto, M ;
Fukuda, S ;
Ashida, Y ;
Fukuda, N .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 198 :1093-1096