Stranski-Krastanow transition and epitaxial island growth

被引:116
作者
Cullis, AG
Norris, DJ
Walther, T
Migliorato, MA
Hopkinson, M
机构
[1] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 3JD, S Yorkshire, England
[2] Univ Bonn, Inst Anorgan Chem, D-53117 Bonn, Germany
来源
PHYSICAL REVIEW B | 2002年 / 66卷 / 08期
关键词
D O I
10.1103/PhysRevB.66.081305
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A detailed examination is presented of the way in which the Stranski-Krastanow epitaxial islanding transition can be controlled by strain due to elemental segregation within the initially-formed flat "wetting" layer. Calculations using a segregation model are shown to accord well with experimentally measured critical wetting-layer thicknesses for the InxGa1-xAs/GaAs system (x=0.25-1). The strain energy associated with the segregated surface layer is determined for the complete range of deposited In concentrations using atomistic simulations. The segregation-mediated driving force for the Stranski-Krastanow transition is considered also to be important for all other epitaxial systems exhibiting the transition.
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页码:1 / 4
页数:4
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